the Wake Forest University
Cleanroom and Integrated Microfabrication Facility
the WFU CIMF is a class 1000 microfabrication facility that is built around 3 basic techniques for creating structure.
Optical lithography based on 365 nms (i Line).
e-beam capabilities based on vector image generation using a dedicated JEOL 6340F SEM.
Dip-pen nano writing.
publications
The Environment
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1200 sq. ft. of floorspace with turbulent air return plenum, sealed ceiling suspension, gowning room entrance,
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1500 lux yellow lighting using Lithoprotect (TM) light filters,
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Class 1000 / ISO 6 with two particle monitoring stations
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Acid/Base wash stations.
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Organics cluster and Inorganics cluster.
Access
1. Completion of safety training program
2. Clearance by facilities management
3. Full gowning and cleanroom hygiene
4. 5 person max.
The WFU Cleanroom Facility is an active research and teaching facility. Courses and Workshops on lithography, deposition, and metrological processes are held regularly, through the Nanotechnology Center. Check for listings and updates. All facility users must read and understand the training manual and watch the safety video provided here. Facility Managers determine access to the facilities.
Training Materials
Gowning and basic cleanroom practice (vid)
Chemical Safety (vid)
Cleanroom Manual (pdf)
After this you are ready for training on individual tools. You must schedule this with the cleanroom manager
Alpha Stepper /profilometer
Surface tensiometer
Ellipsometer
Metallographic/Fluorescence microscope
Probe station
Basic OLED, FIPEL, OPV, OFT capabilities in both small molecules and polymers with a wide range of contacts and stack structures. UV sealants
Dual compartment gloveboxes with thermal evaporator, testing stations, spinners, hot plates, scales, etc.
ITO/glass handling, cutting and processing tools.
Acid/Base fume hood system with organic solution processing capabilities.
Coaters:
spray coater
auto-dip coater
automated drawblade
dedicated evaporative
The micro/nano fab capabilities are based on monolithic UV
lithography (~365 nm). Simple mask creation is possible however 3X3 chrome on quartz masks from third party suppliers are recommended.
DIMATIX print system
Resist spinner
Vacuum oven
Tube oven
Developing stations
Plasma Etcher (Anatech)
Ozone cleaner
UV flood light box
Karl Suss MJB3 mask aligner
AC/DC magnetron sputtering system,
VSW e-beam evaporator
Edwards thermal evaporator
VSW thermal evaporator
VSW Sputter cleaning/Ashing/RIE system