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Wake Forest University
Center for Nanotechnology and Quantum Materials
NanoteQ
Integrated Microfabrication Facility
IMF
Build Structures
Package and Protect
Characterize Thin Films
Tools
The Integrated MicroFabrication Facility at Wake Forest University is designed for the basic construction of semiconductor-based micro-devices, MEMs, micro-fluidics, etc.
The Cleanroom - is a class 1000 (ISO 6) facility designed by the NanoteQ-Fabrik group. This space is ~1000 sq. ft. of floorspace with a turbulent return air plenum, 4 complete air-changes per minute, 24 oC +/- 2 oC, 35% humidity +/- 2 %, 1500 lux yellow lighting (Lithoprotect filtration), two particle monitoring stations, a dedicated gowning room (ISO 7) and a suite of lithography capabilities ranging from e-beam lith. and FIB to i-line, 365 nm optical lithography.
Sputtering and e-beam
Mask aligner
cleanroom
Sputtering and e-beam
Rules of Access
1. Access to the facilities requires permission of the Center director. Training for the cleanroom and the tool to be used is necessary to use the facility and its equipment.
2. All users must sign in and provide a description of processes and equipment to be used during each session.
3. No working alone, the buddy system applies. This is done for safety reasons. Some senior cleanroom personnel are allowed to work alone (superusers) but this requires permission from the Center director.
4. Equipment may only be used in the manner for which was designed.
5. Report all damage or malfunctions as soon as it is noticed.
Training: Videos and Reading
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Gowning and basic cleanroom practice (1 NASA vid)
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Chemical Safety (22 ACS vid series)
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Cleanroom Gowning Manual (pdf)