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the Wake Forest University - Nano and Quantum Technologies Laboratory
Lithography
3 Karl Suss Mask Aligners: These systems are upgraded, mechanical MJB3's.
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# 1 UV0200 deep UV with backside alignment,
#2 UV0300 UV band for high performance resists,
#3 is a standard 200W system for general purpose use.
All three have digital imaging systems, data storage, and are regularly maintenanced.
Focussed Ion Beam: FIB is a FEI 200M with a rebuild and service from TSS.
• Magnum column: 5-30kV
• Milling power: 21nA beam current
• CDEM for ions and electron images with 7nm resolution
• Windows OS and FEI UI
• 5-axis, comp-eucentric tilt stage
• Full coverage of 70mm diameter
• Motorized XYZ: 25 x 25 x 25mm x Rotation x 360° x Manual T -15° +60
• Front door load
• Chamber scope for real time observation
• Gas Injection System: Max 4 injectors, 2 included; chemistry of choice
• Vacuum system: column IGP, air cooled turbo and mechanical PVP
Nabity NPGS: e-beam lithography built on a Zeiss Supra 25 with Schottky Field emission gun. System also has EDAX system.
2 Laurell Resist Spinners: These programmable spinners are set up for #1 standard use resists such as SU8, and #2 etch resistant resists such as Zep 520 or ma-N 2400.. Using separate spinners helps to avoid any potential cross contamination.
DPN 2000 dip pen lithography system. Nanoinks dipped lithography system is a SPM based writing system that uses chemically functionalized inks to create 2D structures across substrates. it has a resolution of approximately 1 nm and couples chemistry with lithographic functionality. This instrument is located in Microscopy, not in the cleanroom.
Wet Benches with acid and base hoods, refrigerated storage, and vented chemical storage. RM 98 does NOT provide for general sample storage so users will need to keep samples with them.
Processing Ovens: standard cleanroom compliant vacuum ovens for processing. There is only one vacuum processing oven in the cleanroom facility. RM98Aux, next door has a variety of clean ovens that allow for doping, high temperature anneals etc.
Mask design software: used to design masks and allows circuit simulation. While Rm98 can produce dies and PCB's we do not make our own masks typically. There are a number of mask sources and we submit designs to them with a 1 week turn around time generally.
Deposition/Etching
Thermal Evaporation: Our Edwards thermal evaporator system is cleanroom compatible and uses cryoshielding to protect against contaminants during evaporation. It is used for metals only.
AC/DC Sputtering Kurt Lesker Nano 36. This is a well maintained workhorse system that offers Ar and O2 gasses.
e Beam Evaporator Kurt Lesker, cryopumped AXXIS system with e-beam evaporation, and two sputter sources. The AXXIS allows for co-sputtering as well as ebeam evaporation. There is even a thermal source on the system.
PECVD system: Oxford Plasma 80 Plus. Gases: SiH4, NH3, and N2. This is used for hard mask formation primarily (SNx) but can also be configured for dielectric thin films. The system is setup for simple "few step" processes currently.
Anatech HUMMER V: Ar / O2 plasma etcher/asher used for basic rough washing and etching jobs.
UV ozone cleaner
Reactive ion etcher (RIE): Oxford plasma 80 plus. gasses: CF4 and O2. This system is used for structural refinement, and/or etch removal of substrate in circuit designs.
Ion Mill: US Gun II based Ion Mill. Ion milling is a dry etching method used for creating thin film patterns. Our process gas is Ar and It is used to bombard the areas of a sample uncovered by a hard mask. This method is superior to wet chemical etching and lift-off process because it does not involve chemical reactions or film straining. It allows removal of layers of materials with atomic precision and can form nano-sized patterns.
Wake Gas Manifold System (WGMS): All gasses within the cleanroom used for processing of materials are managed by the WGMS - gas manifold system for safety and effective delivery. This system manages gasses to all sputter, plasma, evaporative systems It is equipped with a variety of safety interlocks so if you need help with it, please seek a superuser.
