top of page
_edited.png)
the Wake Forest University - Nano and Quantum Technologies Laboratory

Lithography


Suss Mask Aligners

Focussed Ion Beam: FIB

Nabity NPGS: e-beam lithography

Resist Spinners

DPN 2000 dip pen lithography system

Wet Benches

Processing Ovens

Mask design software
Deposition/Etching


Thermal Evaporation

AC/DC Sputtering

e Beam Evaporator

PECVD system

Ar or O2 plasma etcher/asher

UV ozone cleaner

Reactive ion etcher (RIE)
bottom of page