Cleanroom Resource Page #1: Optical Lithography and Integrated Devices 

Recommended processes, user practices, and other resources are found here for each tool in the Optical Lithography cluster.

Hummer X.jpg

Plasma Etch

Anatech Hummer X with Ar or O2 process gas

Status

Operational

Video
Manual
Process Suggestions
1010Small.png

Ozone Cleaner

UVOCS UV ozone preparation system

Status

Operational

Video
Manual
Process Suggestions
toven.jpeg

Tube Oven

Oxide Growth and Doping

Status

Operational

Video
Manual
Process Suggestions
oven.jpeg

Vac Oven

Fischer vacuum oven

Status

Operational

Video
Manual
Process Suggestions
laurell.jpg

Laurell Spinner

Reserved for resist spinning

Status

Operational

Video
Manual
Process Suggestions
light box.jpg

UV light box

Used for creating masks

Status

Operational

Video
Manual
Process Suggestions
reducer.png

VSW Reducer

Reduces template to create a master mask. f = 0.26 quartz reticle, 365 nm light source

Status

Being installed

Video
Manual
Process Suggestions
FUJIFILM_Dimatix_Materials_Printer_7.201

DIMATIX printer

Materials printer used for making high density mask templates

Status

Operational

Video
Manual
Process Suggestions
Karl-Suss-MJB3-Mask-Aligner_For-Sale_Lot

Mask Aligner

Karl Suss MJB3 manual mask alignment system with updated light source

Status

Operational

Video
Manual
Process Suggestions
IMG_5856.jpg

VSW evap #1

Used for creating masks

Status

Operational

Video
Manual
Process Suggestions
sputter lesker.jpeg

Sputter Deposit

Kurt Lesker Nano 36 AC/DC Magnetron sputtering system

Status

Operational

Video
Manual
Process Suggestions
BALZERS-Evaporator-With-Pfeifer-Turbomol

Balzers e- Beam

Electron Beam evaporator system

Status

In repair

Video
Manual
Process Suggestions
139.jpg

RIE/Asher

VSW RIE/Asher with Ar or O2 process gasses

Status

in Repair

Video
Manual
Process Suggestions