Karl Suss MJB3 Mask Aligner

3" masks 300 W 365 nm UV

(1990's) updated with digital imaging new light source and rebuilt staging

FEI 200M FIB 

Magnum column: 5-30kV, Milling power: 21nA beam current, CDEM for ions and electron images with 7nm resolution, Windows OS and FEI UI; TSS networking computer, 5-axis, comp-eucentric tilt stag, Full coverage of 70mm diameter, Motorized XYZ: 25 x 25 x 25mm x Rotation x 360° x Manual T -15° +60, Chamber scope, Gas Injection System: 2 injectors
(2005 ISS rebuild 2024)

Nabity NPGS direct write electron beam lithography system mounted on a JEOL 6330F with an Oxford Inca EDS system for substrate characterization. (2005 system)

Laurell resist spinner and SCS P6700 programmable spinning system (2020)

DPN 2000 dip pen lithography system (2010)

Assorted Light Boxes for making PCBs

Optical reducing system for mask fabrication. House designed and built. Used for creating speciality masks

Assorted setting vacuum ovens for processing resist