Wake Forest University
Cleanroom Resource Page #1: Optical Lithography and Integrated Devices
Recommended processes, user practices, and other resources are found here for each tool in the Optical Lithography cluster.
Plasma Etch
Anatech Hummer X with Ar or O2 process gas
Status
Operational
Video
Manual
Process Suggestions
Ozone Cleaner
UVOCS UV ozone preparation system
Status
Operational
Video
Manual
Process Suggestions
Tube Oven
Oxide Growth and Doping
Status
Operational
Video
Manual
Process Suggestions
Vac Oven
Fischer vacuum oven
Status
Operational
Video
Manual
Process Suggestions
Laurell Spinner
Reserved for resist spinning
Status
Operational
Video
Manual
Process Suggestions
UV light box
Used for creating masks
Status
Operational
Video
Manual
Process Suggestions
VSW Reducer
Reduces template to create a master mask. f = 0.26 quartz reticle, 365 nm light source
Status
Being installed
Video
Manual
Process Suggestions
DIMATIX printer
Materials printer used for making high density mask templates
Status
Operational
Video
Manual
Process Suggestions
Mask Aligner
Karl Suss MJB3 manual mask alignment system with updated light source
Status
Operational
Video
Manual
Process Suggestions
VSW evap #1
Used for creating masks
Status
Operational
Video
Manual
Process Suggestions
Sputter Deposit
Kurt Lesker Nano 36 AC/DC Magnetron sputtering system
Status
Operational
Video
Manual
Process Suggestions
Balzers e- Beam
Electron Beam evaporator system
Status
In repair
Video
Manual
Process Suggestions
RIE/Asher
VSW RIE/Asher with Ar or O2 process gasses
Status
in Repair
Video
Manual
Process Suggestions