Wake Forest University

Cleanroom Resource Page #1: Optical Lithography and Integrated Devices
Recommended processes, user practices, and other resources are found here for each tool in the Optical Lithography cluster.

Plasma Etch
Anatech Hummer X with Ar or O2 process gas
Status
Operational
Video
Manual
Process Suggestions

Ozone Cleaner
UVOCS UV ozone preparation system
Status
Operational
Video
Manual
Process Suggestions

Tube Oven
Oxide Growth and Doping
Status
Operational
Video
Manual
Process Suggestions

Vac Oven
Fischer vacuum oven
Status
Operational
Video
Manual
Process Suggestions

Laurell Spinner
Reserved for resist spinning
Status
Operational
Video
Manual
Process Suggestions

UV light box
Used for creating masks
Status
Operational
Video
Manual
Process Suggestions

VSW Reducer
Reduces template to create a master mask. f = 0.26 quartz reticle, 365 nm light source
Status
Being installed
Video
Manual
Process Suggestions

DIMATIX printer
Materials printer used for making high density mask templates
Status
Operational
Video
Manual
Process Suggestions

Mask Aligner
Karl Suss MJB3 manual mask alignment system with updated light source
Status
Operational
Video
Manual
Process Suggestions

VSW evap #1
Used for creating masks
Status
Operational
Video
Manual
Process Suggestions

Sputter Deposit
Kurt Lesker Nano 36 AC/DC Magnetron sputtering system
Status
Operational
Video
Manual
Process Suggestions

Balzers e- Beam
Electron Beam evaporator system
Status
In repair
Video
Manual
Process Suggestions

RIE/Asher
VSW RIE/Asher with Ar or O2 process gasses
Status
in Repair
Video
Manual
Process Suggestions