Cleanroom Resource Page
The Optical Lithography Cluster
Center for Nanotechnology and Molecular Materials at Wake Forest University
Plasma Etch
Anatech Hummer X with Ar or O2 process gas
Status
Operational
Ozone Cleaner
UVOCS UV ozone preparation system
Status
Operational
Tube Oven
Linde Blue Oxide Growth and Doping oven
Status
Operational
Vac Oven
Fischer vacuum oven
Status
Operational
Laurell Spinner
Reserved for resist spinning
Status
Operational
UV light box
Used for creating masks
Status
Operational
VSW Reducer
Reduces template to create a master mask. f = 0.26 quartz reticle, 365 nm light source
Status
Being installed
DIMATIX printer
Materials printer used for making high density mask templates
Status
Operational
Mask Aligner
Karl Suss MJB3 manual mask alignment system with updated light source
Status
Operational
VSW evap #1
General purpose metal evap. Quartz crystal monitor for film thickness, extra high bell jar for clearance, multiple ports for add-ons.
Status
Operational
Sputter Deposit
Kurt Lesker Nano 36 AC/DC Magnetron sputtering system
Status
Operational
Balzers e- Beam
Electron Beam evaporator system
Status
In repair
RIE/Asher
VSW RIE/Asher with Ar or O2 process gasses
Status
in Repair
status update 12/22
Overview
This tool cluster is designed to create micron or sub micron structures in Si substrates using 365 nm lithography (otherwise known as i-line).
Library